Abstract:
The need for technological advancement in the field of electronics has been ever increasing. Till now silicon has been the prime material of choice for meeting the current demands. However, silicon has its own limitations; Silicon based integrated circuits and the scaling of silicon MOSFET design faces complications like tunneling effect, gate oxide thickness effect etc. which has given the scope for new materials to emerge. The growing academic interest in carbon nanotubes (CNT) as a promising novel class of electronic material has led to significant progress in the understanding of CNT physics including ballistic and non-ballistic electron transport characteristics. In a nanotube, low bias transport can be nearly ballistic across distances of several hundred nanometers. Non-ballistic CNT transistors have been considered, and extended circuit-level models which can capture both ballistic and non-ballistic electron transport phenomenon, including elastic, phonon scattering, strain and tunneling effects, have been developed. The purpose of this paper is to establish a comparative analysis of the transport characteristics of ballistic and non-ballistic carbon nanotubes. The simulation is carried out using MATLAB and the main focus is on the changes in the I-V characteristic curves of elastic scattering effect, bandgap strain effect, tunneling effect and the overall combined effect, varying the parameters such as gate oxide thickness, temperature, dielectric constant, and chirality. The obtained results were then compared to their respective ballistic results. We verified our work by further comparison of our findings with other established academic papers published under the same category.
